First of all, their products can be used to understand the ways in which to wash.
The second is to achieve, what kind of cleaning.
third is to determine the pre-silicon ultrasonic cleaning machine cleaning of quantity, to buy the machine maximum capacity is how much.
The fourth step is wafer cleaning process of ultrasonic cleaning machines to understand, ask your peers what kind of process is used, or consult the manufacturer of ultrasound has not updated the silicon ultrasonic cleaning machine cleaning process.
fifth is to choose some of the professional manufacturers for wafer cleaning process ultrasonic cleaning machine, LED spot light compare prices and service security.
sixth signing of the contract in the materials used to make equipment brands and models, prices of consumables, maintenance terms, and so included in the contract agreement, in case some poor producers of fraud.
Seventh is the acceptance, if it is large equipment, you try to bring your piece to the production company to on-site inspection.
eighth is installed on the training of your employees, you are sure your employees are not really learn to install said staff have been trained before.
specific segments:
1. The power of choice
silicon ultrasonic cleaning machine cleaning and sometimes with a small power, take a long time not remove dirt. If the power reaches a certain value, the dirt will soon be removed. If you select too much power, will greatly increase the cavitation intensity, wafer cleaning effect of ultrasonic cleaning machine is increased, but this time more sophisticated parts also had a loss point, and ultrasonic cleaning machine cleaning machine silicon bottom plate vibration cavitation severe pitting corrosion also increases water in the use of TCE and other organic solvents, it is basically no problem, but the use of water or water-soluble silicon ultrasonic cleaning machine cleaning fluid, easy-to-point corrosion by water, if the vibration plate surface is by injuries, high power underwater cavitation corrosion under more severe, so choose according to actual use of ultrasonic power.
2. Frequency of choice
silicon ultrasonic cleaning machine cleaning frequency from 28kHz to 120kHz, between the use of water or water-silicon ultrasonic cleaning machine cleaning agent by the cavitation caused by the physical wafer cleaning power ultrasonic cleaning machine is clearly beneficial for low-frequency, commonly used 28-40kHz or so. led light power supply Small gap, slit, deep silicon parts cleaning ultrasonic cleaning machines, high frequency (typically 40kHz or more) is better, and even a few hundred kHz. Watch parts of the silicon wafer cleaning ultrasonic cleaning machine, with 100kHz. If using broadband FM wafer cleaning ultrasonic cleaning machine, the effect is better.
3. Wafer cleaning basket, ultrasonic cleaning machine using
in silicon ultrasonic cleaning machine cleaning small parts items, often using the basket, mesh to cause ultrasonic attenuation due to special attention. When the frequency of 28khz over the use of 10mm mesh as well.
4. Silicon ultrasonic cleaning machine cleaning fluid temperature
water wafer cleaning ultrasonic cleaning machine liquid silicon optimum cleaning temperature of ultrasonic cleaning machines 40-60 ℃, especially in the cold weather if the silicon ultrasonic cleaning machine cleaning fluid of low temperature effect is poor, silicon ultrasonic cleaning machine cleaning effect is poor. Therefore, ultrasonic cleaning machine, some silicon wafer cleaning machine ultrasonic cleaning machine cleaning tank heated electric wire around the outside temperature control, when the temperature increases, the cavitation-prone, so the wafer cleaning ultrasonic cleaning machine is better. When the temperature continues to rise after the gas pressure inside the cavity increases, pressure drop caused by the impact, the effect will diminish. Organic solvent cleaning machine ultrasonic cleaning liquid silicon will have to close to the boiling point temperature of silicon ultrasonic cleaning machine cleaning.
5. Silicon ultrasonic cleaning machine cleaning fluid and the amount of silicon parts cleaning ultrasonic cleaning machine to determine the location
6. Silicon ultrasonic cleaning machines and wafer cleaning processes Ultrasonic cleaning machine cleaning fluid selection
